In EUV machines a tin droplet is hit by a laser pulse 50k times per second in order to create EUV light. Our group is responsible for positioning this laser within the beam path an…
The Optomechanics Competence Group focuses on transferring and developing knowledge related to optomechanical design, including processes, concepts, and solutions. This mainly invo…
Wafer stage, as an important module of ASML’s lithography machine, plays a crucial role in achieving high-acceleration motion and nano-meter performance. To mitigate the stage-indu…
Wafer Table Cleaning provides an automatic, in-situ cleaning solution for focus spots caused by contamination in between burls of the clamp and wafer, and extend the lifetime of th…